Global Sputter Targets Market Size, Status and Forecast 2022

SKU ID :QYR-19620836 | Published Date: 30-Nov-2021 | No. of pages: 128
Sputtering is a technology used to form a thin film on a silicon wafer, glass, or other substrate. Within a vacuum state maintained in a sputtering machine, a sputtering target is bombarded with argon ions. This causes atoms or molecules to be emitted from the sputtering target. The atoms or molecules are deposited and form a thin film on the substrate. A sputtering target is the object of the ion bombardment when sputtering takes place.
Global core sputter targets manufacturers include Materion (Heraeus), JX Nippon Mining & Metals Corporation etc. The top 5 companies hold a share about 44%. Asia Pacific is the largest market, with a share about 83%, followed by North America and Europe with the share about 10% and 5%.

Market Analysis and Insights: Global Sputter Targets Market
The global Sputter Targets market size is projected to reach US$ 5160.6 million by 2027, from US$ 3860.3 million in 2020, at a CAGR of 2.1% during 2021-2027.
With industry-standard accuracy in analysis and high data integrity, the report makes a brilliant attempt to unveil key opportunities available in the global Sputter Targets market to help players in achieving a strong market position. Buyers of the report can access verified and reliable market forecasts, including those for the overall size of the global Sputter Targets market in terms of revenue.
On the whole, the report proves to be an effective tool that players can use to gain a competitive edge over their competitors and ensure lasting success in the global Sputter Targets market. All of the findings, data, and information provided in the report are validated and revalidated with the help of trustworthy sources. The analysts who have authored the report took a unique and industry-best research and analysis approach for an in-depth study of the global Sputter Targets market.

Global Sputter Targets Scope and Market Size
Sputter Targets market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Sputter Targets market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on revenue and forecast by Type and by Application in terms of revenue and forecast for the period 2016-2027.

Segment by Type
Metal Target
Alloy Target
Ceramic Compound Target

Segment by Application
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others

By Region
North America
U.S.
Canada
Europe
Germany
France
U.K.
Italy
Russia
Nordic
Rest of Europe
Asia-Pacific
China
Japan
South Korea
Southeast Asia
India
Australia
Rest of Asia
Latin America
Mexico
Brazil
Rest of Latin America
Middle East & Africa
Turkey
Saudi Arabia
UAE
Rest of MEA

By Company
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
TOSOH
Ningbo Jiangfeng
Luvata
Heesung
Fujian Acetron New Materials Co., Ltd
Longhua Technology Group (Luoyang) Co., Ltd.
GRIKIN Advanced Material Co., Ltd.
Umicore Thin Film Products
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Changzhou Sujing Electronic Material
Linde
Konfoong Materials International Co., Ltd
LT Metal
TANAKA
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